Plenary Speakers

Hidetoshi KATORI

Department of Applied Physics, The University of Tokyo, Japan
Quantum Metrology Laboratory, RIKEN, Japan

"Optical Lattice Clocks: Seeking for a New Second"

The 'magic frequency' protocol has made it possible to design new type of atomic clocks based on well-engineered perturbations. Such 'optical lattice clocks' allow extremely precise and speedy timekeeping, which targets fractional uncertainty of 10-18 and below. Dramatic progresses of optical lattice clocks, are overviewed. Possible impacts and future applications of optical clocks are discussed, such as testing the fundamental laws of physics and developing relativistic geodesy that relies on the general relativistic time dilation.

Jumpei TSUJIUCHI

Professor emeritus, Tokyo Institute of Technology, Japan

"Holography in Mechanical Engineering"

Holography is a field in physics using physical properties of light waves, and many applications are in process in various fileds in science, technology, and art expression. In this talk, basic concepts and technologies in holography, various applications connected with mechanical engineering together with practical examples will be shown.

Invited Speakers(alphabetical)

George BARBASTATHIS

Massachusetts Institute of Technology, USA
"Compressive phase retrieval"

Indrani BHATTACHARYA

University of Engineering & Management, India
"Optical micro-trapping by Azimuthal Walsh Filter"

Robert BRUNNER

Ernst Abbe Hochschule Jena, Germany
"Adaptive optics in nature(tentative)"

Hyuck CHOO

California Institute of Technology, USA
"Remote intraocular pressure monitoring using an implantable compact optomechanical sensor"

Juergen CZARSKE

Technical University Dresden, Germany
"Microscopy with adaptive lenses(tentative)"

Ryoichi HORISAKI

Osaka University, Japan
"Holographic sensing based on random diffraction"

Hideki INA

Canon Inc. Device Technology Development Headquarters, Japan
"Model Based Optical Metrology in Lithography - Inverse Problem -"
The semiconductor industry is moving toward 20nm nodes and below. Optical metrology is key issue for lithography. In this time I make a review three kind of model based optical metrology that are based on inverse problem theorem. First is Scatterometory to measure CD (Critical Dimension) value of resist pattern and etched pattern as inspection. Second is wafer focus measurement using KL (Karhunen-eve) expansion for exposure tool. Third is QMERIT for overlay measurement tool as inspection. To satisfy the increasing demand for extremely tight CD control and overlay accuracy in semiconductor manufacturing processes, these metrology systems are useful to meet their demand. And I believe an inverse problem is a method to introduce a new phenomenon.

Chulmin JOO

Yonsei University,Korea

Jae Gwan KIM

Gwangju Institute of Science and Technology, Korea

Pramod RASTOGI

EPFL,Switzerland

Wolfgang SCHADE

Head of Department Fiber Optical Sensor Systems, Fraunhofer HHI
Head of Department Applied Photonics, IEPT, Clausthal University of Technology
“Fiber optical sensors – nerves made out of glass”

Ulrike WALLRABE

University of Freiburg, Department for Microsystems Engineering, Laboratory for Microactuators
" Piezo actuated adaptive lenses"
Piezoelectric adaptive lenses are mostly built from PDMS leading to spherical lens shapes which can be tuned in a large range of focal power. Alternatively, they are equipped with thin glass membranes which allow to control an aspherical behavior. We discuss the use of those lenses in a hyperspectral imaging set-up and an ultra-compact microscope to be combined with NMR imaging.